| Overall dimension | 2.0*2.0*2.5m | |
| Effective coating space | 590 * 400mm | |
| Air extraction system | Molecular pump + mechanical pump | |
| Power Supply | 50KW,380V,50HZ,3PHASE | |
| Bias | High frequency pulse power supply | |
| Number of target sources | 4,Magnetron sputtering 1 ~ 3, ion source 1 ~ 3 | |
| Control system | Programmable controller + computer | |
| Coating process temperature | 80 ~ 180 degrees | |
| Typical coating | Sputtering tin titanium nitride, sputtering CrN chromium nitride, DLC diamond-like carbon, etc. single layer, composite, nano coating | |